Open AccessFabrication of periodic nanovein structures by holography lithography technique
Author(s) -
Ngoc Diep Lai,
Yu Di Huang,
Jian Hung Lin,
Danh Bich,
Chia Chen Hsu
Publication year - 2009
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.003362
Subject(s) - photoresist , photonic crystal , materials science , fabrication , lithography , optics , holography , photonics , grating , interference lithography , interference (communication) , optoelectronics , electron beam lithography , photolithography , template , resist , diffraction grating , band gap , nanotechnology , medicine , channel (broadcasting) , alternative medicine , physics , electrical engineering , engineering , layer (electronics) , pathology
This work demonstrates a promising method to fabricate periodic nanovein structures, which can be served as templates for fabricating photonic crystals possessing a large complete photonic bandgap. First, the fabrication of a one-dimensional grating structure connected with nanolines is demonstrated by controlling the exposure dosage of the second exposure of the two-exposure two-beam interference technique. Secondly, by using the same interference technique but setting each exposure under the same exposure dosage, two-dimensional periodic structures with nanovein connections were fabricated. These structures were obtained by using either a pure negative photoresist with very low concentration of photoinitiator or a mixing of a negative and a positive photoresists. The fabricated structures are not, as usual, a duplication of the interference pattern but are constituted by square or triangular rods connecting with narrow veins. They can be used as templates for fabricating photonic crystals with very large complete photonic bandgap.