Open AccessHigh speed volumetric thickness profile measurement based on full-field wavelength scanning interferometer
Author(s) -
Jong-Bum You,
Soohyun Kim,
Daesuk Kim
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.021022
Subject(s) - optics , interferometry , michelson interferometer , profilometer , materials science , wavelength , white light interferometry , optical path length , phase (matter) , measure (data warehouse) , physics , computer science , surface finish , database , quantum mechanics , composite material
A novel high speed volumetric thickness profilometry based on a wavelength scanning full-field interferometer and its signal processing algorithm is described for a thin film deposited on pattern structures. A specially designed Michelson interferometer with a blocking plate in the reference path enables us to measure the volumetric thickness profile by decoupling two variables, thickness and profile, which affect the total phase function phi(k). We show experimentally that the proposed method provides a much faster solution in obtaining the volumetric thickness profile data while maintaining the similar level of accurate measurement capability as that of the least square fitting method.