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Near- to far-field imaging of phase evolution of light emanating from a metal nanoslit
Author(s) -
Yun Suk Jung,
Yonggang Xi,
Jeff Wuenschell,
Hong Koo Kim
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.018881
Subject(s) - optics , near and far field , wavefront , diffraction , surface plasmon , phase (matter) , materials science , interference (communication) , plasmon , near field optics , extraordinary optical transmission , surface plasmon polariton , physics , optical microscope , scanning electron microscope , channel (broadcasting) , electrical engineering , quantum mechanics , engineering
We report near- to far-field measurement of optical wavefronts emanating from a nanoslit formed in a thin (50 nm thick) Ag film. The evolution of optical phases is imaged using a self-interference technique in conjunction with a scanning probe method. The phase relationship of the slit-transmitted waves with respect to the direct transmission through the thin metal film is quantitatively established. The singular-phase points resulting from the interplay of slit diffraction and surface plasmons are identified in the intermediate-field region.

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