Open AccessHigh reflectivity gratings on silicon-on-insulator waveguide facets
Author(s) -
Jens H. Schmid,
Pavel Cheben,
J. Lapointe,
Siegfried Janz,
A. Delâge,
A. Densmore,
DanXia Xu
Publication year - 2008
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.016481
Subject(s) - optics , materials science , grating , silicon on insulator , silicon , finite difference time domain method , waveguide , reflectivity , diffraction grating , diffraction , rigorous coupled wave analysis , optoelectronics , physics
We demonstrate by numerical simulations and experiments that highly reflective (HR) facets can be formed on silicon waveguides with high reflectivity diffraction gratings. We use an HR grating with a plane wave reflectivity exceeding 99.99%, as calculated by rigorous coupled wave analysis. Experimentally, we demonstrate the HR effect for silicon-on-insulator waveguide facets patterned lithographically with grating structures. Due to a strong mode size dependence, the maximum facet reflectivity for 1.5 microm thick waveguide is 77%, but finite difference time-domain simulations show that modal reflectivies larger than 90% can be achieved for silicon waveguides with thicknesses of 4 microm or more.