Open AccessSub-diffraction-limited interference photolithography with metamaterials
Author(s) -
Ting Xu,
Yanhui Zhao,
Jiang Ma,
Changtao Wang,
Jianhua Cui,
Chunlei Du,
Xiangang Luo
Publication year - 2008
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.013579
Subject(s) - metamaterial , photolithography , lithography , optics , diffraction , interference (communication) , interference lithography , materials science , superlens , dispersion (optics) , photomask , computational lithography , optoelectronics , x ray lithography , maskless lithography , electron beam lithography , physics , resist , nanotechnology , fabrication , computer science , telecommunications , medicine , channel (broadcasting) , alternative medicine , pathology , layer (electronics)
We present that an interference lithography technique beyond the diffraction limit can be theoretically achieved by positing an anisotropic metamaterial under the conventional lithographic mask. Based on the special dispersion characteristics of the metamaterial, only the enhanced evanescent waves with high spatial frequencies can transmit through the metamaterial and contribute to the lithography process. Rigorous coupled wave analysis shows that with 442nm exposure light, one-dimensional periodical structures with 40nm features can be patterned. This technique provides an alternative method to fabricate large-area nanostructures.