Open AccessFabrication of photonic crystals with functional defects by one-step holographic lithography
Author(s) -
Juntao Li,
Yikun Liu,
Xiangsheng Xie,
Peiqing Zhang,
Bing Liang,
Yan Li,
Jianying Zhou,
Gershon Kurizki,
Daniel A. Jacobs,
Kam Sing Wong,
Yi Zhong
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.012899
Subject(s) - photonic crystal , optics , lithography , materials science , holography , fabrication , yablonovite , optoelectronics , photonics , resist , bragg's law , photolithography , electron beam lithography , photonic integrated circuit , phase (matter) , diffraction , nanotechnology , physics , medicine , alternative medicine , pathology , layer (electronics) , quantum mechanics
A one-step introduction of functional defects into a photonic crystal is demonstrated. By using a multi-beam phase-controlled holographic lithography, line-defects in a Bragg structure and embedded waveguides in a two-dimensional photonic crystal are fabricated. Intrinsic defect introduction into a 3-dimensional photonic crystal is also proposed. This technique gives rise to a substantial reduction of the fabrication complexity and a significant improvement on the accuracy of the functional defects in photonic crystals.