Open AccessPolarization selective electro-optic polymer waveguide devices by direct electron beam writing
Author(s) -
Hongcheng Sun,
Antao Chen,
Benjamin C. Olbricht,
Joshua A. Davies,
Philip A. Sullivan,
Yi Liao,
Zhengwei Shi,
Jingdong Luo,
Alex K.Y. Jen,
Larry R. Dalton
Publication year - 2008
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.008472
Subject(s) - polarizer , materials science , optics , poling , extinction ratio , polarization (electrochemistry) , optoelectronics , fabrication , birefringence , electron beam lithography , waveguide , electric field , resonator , wavelength , resist , physics , nanotechnology , chemistry , medicine , alternative medicine , pathology , layer (electronics) , quantum mechanics , dielectric , ferroelectricity
A novel technique for the fabrication of polarization selective electro-optic polymer waveguide devices with direct electron beam writing was described. Birefringence induced by the electric field poling in the electro-optic polymer film was erased in the electron beam exposed regions. The formed waveguides had stronger confinement for the light polarized along the poling direction. High fabrication resolution on the 100 nm scale or smaller could be achieved. Fabrication of polymer polarizer and polarization selective microring resonators with this technique was reported. The highest polarization extinction ratio was measured to be 21.4 dB.