Open AccessDirect electron beam writing of electro-optic polymer microring resonators
Author(s) -
Hongcheng Sun,
Antao Chen,
Benjamin C. Olbricht,
Joshua A. Davies,
Philip A. Sullivan,
Yi Liao,
Larry R. Dalton
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.006592
Subject(s) - materials science , optics , resonator , polymer , optoelectronics , electron beam lithography , chromophore , resist , extinction ratio , cathode ray , electron , wavelength , nanotechnology , chemistry , composite material , physics , layer (electronics) , quantum mechanics , organic chemistry
Electro-optic polymer waveguides in electron beam sensitive polymethyl methacrylate (PMMA) polymer matrix doped with organic nonlinear chromophores could be directly patterned by electron beam exposure with high resolution and smoothness. The polymer in the exposed regions was removed with standard electron beam resist developer and without damaging the chromophore containing polymer waveguides. Feature sizes on the order of 100 nm could be clearly resolved. High quality microring resonators made of YL124/PMMA electro-optic polymer were successfully fabricated with this technique. The measured resonance extinction ratios were more than 16 dB and quality factors were in the range of 10(3) approximately 10(4).