
Subwavelength imaging with anisotropic structure comprising alternately layered metal and dielectric films
Author(s) -
Changtao Wang,
Yanhui Zhao,
Dachun Gan,
Chunlei Du,
Xiangang Luo
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.004217
Subject(s) - permittivity , materials science , dielectric , optics , anisotropy , relative permittivity , optoelectronics , physics
Subwavelength imaging can be obtained with alternately layered metallodielectric films structure, even when the permittivity of metal and dielectric are not matched. This occurs as the effective transversal permittivity tends to be zero or the vertical one approaches infinity, depending on the permittivity value of the utilized dielectric and metal material. Evanescent waves can be amplified through the structure, but not in a manner of fully compensating the exponentially decaying property in dielectric. Numerical illustration of subwavelength imaging is presented for variant configuration of anisotropic permittivity with finite layer number of metallodielectric films.