Open AccessHigh power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets
Author(s) -
Kai Hou,
Simi George,
Aghapi Mordovanakis,
Kazutoshi Takenoshita,
J. Nees,
Bruno LaFontaine,
Martin Richardson,
A. Galvanauskas
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.000965
Subject(s) - extreme ultraviolet lithography , materials science , optics , fiber laser , laser , optoelectronics , lithography , physics
In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers.