Open AccessLight trimming of a narrow bandpass filter based on a photosensitive chalcogenide spacer
Author(s) -
Weidong Shen,
Michel Cathelinaud,
Michel Lequime,
Frédéric Charpentier,
Virginie Nazabal
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.000373
Subject(s) - materials science , optics , band pass filter , wavelength , optoelectronics , chalcogenide , trimming , visible spectrum , optical filter , physics , computer science , operating system
We present an experimental study of the photosensitive properties of a narrow bandpass filter based on a Ge(15)Sb(20)S(65) spacer fabricated by electron beam deposition. For a single layer, near the optical bandgap of this chalcogenide material, the efficiency of the photo-bleaching increases as the central wavelength of the light source for exposure decreases. The maximum relative photo-induced change of the optical thickness reaches about 1%. By using controlled light exposure around 480 nm of a photosensitive narrow bandpass filter centered at 1550 nm, we obtained a spatially localized shift of its peak wavelength up to 5.4 nm. This property is used to perform, for the first time at our knowledge, the post trimming of a narrow bandpass filter with a light beam. A 5 x 5 mm(2) ultra uniform area in which the relative spatial variation of its peak wavelength remains below 0.004% is demonstrated.