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Understanding light intensity thresholds for catastrophic optical damage in LiNbO_3
Author(s) -
M. Carrascosa,
Javier Villarroel,
J. Carnicero,
A. Garcı́a-Cabañes,
J. M. Cabrera
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.000115
Subject(s) - photorefractive effect , refractive index , optics , materials science , light intensity , intensity (physics) , organic photorefractive materials , optoelectronics , physics
The appearance of light intensity thresholds for catastrophic optical damage in LiNbO3 is satisfactorily explained by using a photorefractive model based on the Fe(2+)?Fe(3+) and NbLi(4+)?NbLi(5+) defect pairs. Model simulations of the photorefractive amplification gain as a function of the light intensity present sharp threshold behavior. A similar behavior is shown by the saturating refractive index change. In agreement with experiments, predicted thresholds appear shifted towards higher intensities (up to a 10(4) factor) when the Nb(Li) concentration is decreased or the temperature is increased. The model also explains very recent data on the threshold enhancement with the Fe(2+)/Fe(3+) ratio in optical waveguides.

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