Open AccessDistortion of 3D SU8 photonic structures fabricated by four-beam holographic lithography withumbrella configuration
Author(s) -
Xingyi Zhu,
Yuheng Xu,
Shu Yang
Publication year - 2007
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.016546
Subject(s) - optics , lithography , distortion (music) , materials science , electron beam lithography , diamond , photonic crystal , holography , photonics , diamond turning , negative refraction , optoelectronics , refractive index , physics , resist , nanotechnology , amplifier , cmos , layer (electronics) , composite material
We present a quantitative study of the distortion from a threeterm diamond-like structure fabricated in SU8 polymer by four-beam holographic lithography. In the study of the refraction effect, theory suggests that the lattice in SU8 should be elongated in the [111] direction but have no distortion in the (111) plane, and each triangular-like hole array in the (111) plane would rotate by ~30 degrees away from that in air. Our experiments agree with the prediction on the periodicity in the (111) plane and the rotation due to refraction effect, however, we find that the film shrinkage during lithographic process has nearly compensated the predicted elongation in the [111] direction. In study of photonic bandgap (PBG) properties of silicon photonic crystals templated by the SU8 structure, we find that the distortion has decreased quality of PBG.