Open AccessOptically pumped Si nanocrystal emitter integrated with low loss silicon nitride waveguides
Author(s) -
J. N. Milgram,
J. Wójcik,
P. Mascher,
Andrew P. Knights
Publication year - 2007
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.014679
Subject(s) - materials science , silicon nitride , optoelectronics , plasma enhanced chemical vapor deposition , silicon , waveguide , annealing (glass) , optics , hybrid silicon laser , nanocrystal , nitride , nanotechnology , layer (electronics) , physics , composite material
We describe the integration of optically pumped silicon nanocrystals (Si-ncs) embedded in SiO(2) with low loss silicon nitride slab waveguides. An emission waveguide containing Si-ncs with a broad band emission centered at 850 nm, together with a low loss transmission silicon nitride waveguide forms a two section device. The waveguides are fabricated via the deposition of SiO(x) and silicon nitride using ECR-PECVD. Incorporation of hydrogen through annealing, while beneficial to emission from the Si-ncs, is found to increase material absorption in silicon nitride. This is reconciled by annealing at low temperature. This work shows clearly the potential for this material system as a means for the integration of optical emission and waveguiding using a wholly VLSI compatible processing technology. We further suggest that immediate applications exist in particular in the field of evanescent sensing.