Open AccessEUV reflectance and scattering of Mo/Si multilayers on differently polished substrates
Author(s) -
Sven Schröder,
Torsten Feigl,
Angela Duparré,
Andreas Tünnermann
Publication year - 2007
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.013997
Subject(s) - optics , materials science , extreme ultraviolet lithography , specular reflection , scattering , surface finish , surface roughness , substrate (aquarium) , thin film , silicon , wavelength , optoelectronics , nanotechnology , physics , composite material , oceanography , geology
Highly reflective Molybdenum/Silicon multilayer mirrors for 13.5 nm are characterized at-wavelength using a new laboratory size measurement system for EUV reflectance and scattering. Roughness analysis before and after coating by Atomic Force Microscopy indicates roughness enhancement as well as smoothing effects during thin film growth. The impact of the substrate finish and the deposition process onto the scattering distribution and scatter losses with regard to the specular reflectance is analyzed.