Open AccessAntireflection of transparent polymers by advanced plasma etching procedures
Author(s) -
Ulrike Schulz,
Peter Munzert,
Robert Leitel,
Irmina Wendling,
Norbert Kaiser,
Andreas Tünnermann
Publication year - 2007
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.013108
Subject(s) - anti reflective coating , materials science , etching (microfabrication) , thin film , plasma etching , polymer , optics , optoelectronics , layer (electronics) , durability , reactive ion etching , deposition (geology) , plasma , optical coating , nanotechnology , composite material , paleontology , physics , quantum mechanics , sediment , biology
Self-organized nanostructures that provide antireflection properties grow on PMMA caused by plasma ion etching. A new procedure uses a thin initial layer prior to the etching step. Different types of antireflective structures can now be produced in a shorter time and with fewer limitations on the type of polymer that can be used. The durability of the structured surfaces can be improved by the deposition of additional thin films.