Open AccessFour beams evanescent waves interference lithography for patterning of two dimensional features
Author(s) -
Jeun Kee Chua,
Vadakke Matham Murukeshan,
Sia Kim Tan,
Qun Ying Lin
Publication year - 2007
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.003437
Subject(s) - optics , evanescent wave , total internal reflection , interference (communication) , interference lithography , plane wave , wavelength , polarization (electrochemistry) , superlens , physics , lithography , ray , reflection (computer programming) , dielectric , materials science , optoelectronics , fabrication , medicine , channel (broadcasting) , chemistry , alternative medicine , electrical engineering , pathology , computer science , programming language , engineering
This work presents a theoretical study of using the interference of multiple counter-propagating evanescent waves as a lithography technique to print periodic two dimensional features. The formulation of the three dimensional Cartesian space expression of an evanescent wave is presented. In this work, the evanescent wave is generated by the total internal reflection of a plane wave at the interface between a incident dielectric material and a weakly absorbing transmission medium. The influences of polarization, incident angle and the phase shifting of the incident plane waves on the evanescent wave interference are studied. Numerical simulation results suggest that this technique enables fabrication of periodic two dimensional features with resolution less than one third the wavelength of the irradiation source.