Open AccessImprinted silicon-based nanophotonics
Author(s) -
Peter Ingo Borel,
Brian Bilenberg,
Lars Hagedorn Frandsen,
Theodor Nielsen,
Jacob Fage-Pedersen,
Andrei V. Lavrinenko,
Jakob Søndergaard Jensen,
Ole Sigmund,
Anders Kristensen
Publication year - 2007
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.001261
Subject(s) - nanophotonics , nanoimprint lithography , materials science , electron beam lithography , silicon , silicon on insulator , optoelectronics , photonic crystal , optics , lithography , silicon photonics , fabrication , nanotechnology , resist , medicine , alternative medicine , physics , pathology , layer (electronics)
We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabricated by nanoimprint lithography. In our demonstration, we have realized ordinary and topology-optimized photonic crystal waveguide structures. The topology-optimized structures require lateral pattern definition on a sub 30-nm scale in combination with a deep vertical silicon etch of the order of ~300 nm. The nanoimprint method offers a cost-efficient parallel fabrication process with state-of-the-art replication fidelity, comparable to direct electron beam writing.