Large-area magnetic metamaterials via compact interference lithography | Zendy

Nils Feth | Zendy; C. Enkrich | Zendy; Martin Wegener | Zendy; Stefan Lindén | Zendy

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Large-area magnetic metamaterials via compact interference lithography

Author(s) -

Nils Feth,

C. Enkrich,

Martin Wegener,

Stefan Lindén

Publication year - 2007

Publication title -

optics express

Language(s) - Uncategorized

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.15.000501

Subject(s) - metamaterial , optics , materials science , lithography , electron beam lithography , dielectric , wavelength , photonic metamaterial , split ring resonator , transformation optics , homogeneity (statistics) , optoelectronics , resist , physics , nanotechnology , statistics , mathematics , layer (electronics)

Magnetic metamaterials with magnetic-dipole resonances around 1.2-mum wavelength are fabricated using an extremely compact and robust version of two- or three-beam interference lithography for 1D and 2D structures, respectively. Our approach employs a single laser beam at 532- nm wavelength impinging onto a suitably shaped dielectric object (roof-top prism or pyramid) - bringing the complexity of fabricating magnetic metamaterials down to that of evaporating usual dielectric/metallic coatings.The measured optical spectra agree well with theory; the retrieval reveals a negative magnetic permeability. Importantly, the large-scale sample homogeneity is explicitly demonstrated by optical experiments.

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