Open AccessLarge-area magnetic metamaterials via compact interference lithography
Author(s) -
Nils Feth,
C. Enkrich,
Martin Wegener,
Stefan Lindén
Publication year - 2007
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.000501
Subject(s) - metamaterial , optics , materials science , lithography , electron beam lithography , dielectric , wavelength , photonic metamaterial , split ring resonator , transformation optics , homogeneity (statistics) , optoelectronics , resist , physics , nanotechnology , statistics , mathematics , layer (electronics)
Magnetic metamaterials with magnetic-dipole resonances around 1.2-mum wavelength are fabricated using an extremely compact and robust version of two- or three-beam interference lithography for 1D and 2D structures, respectively. Our approach employs a single laser beam at 532- nm wavelength impinging onto a suitably shaped dielectric object (roof-top prism or pyramid) - bringing the complexity of fabricating magnetic metamaterials down to that of evaporating usual dielectric/metallic coatings.The measured optical spectra agree well with theory; the retrieval reveals a negative magnetic permeability. Importantly, the large-scale sample homogeneity is explicitly demonstrated by optical experiments.