Open AccessTime evolution of the second-order nonlinear distribution of poled Infrasil samples during annealing experiments
Author(s) -
Yves Quiquempois,
Alexandre Kudlinski,
G. Martinelli,
G. Quintero,
Paula M. P. Gouvêa,
Isabel C. S. Carvalho,
Walter Margulis
Publication year - 2006
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.14.012984
Subject(s) - poling , erasure , annealing (glass) , ion , materials science , optics , nonlinear system , nonlinear optics , thermal , molecular physics , optoelectronics , chemistry , physics , composite material , laser , thermodynamics , quantum mechanics , computer science , dielectric , ferroelectricity , programming language , organic chemistry
The spatial distribution of the second-order nonlinearity induced in thermally poled Infrasil silica samples is recorded after thermal annealing experiments. Two regimes have been studied: short and long poling durations. For short poling durations, the observations are in good agreement with a model where only one ion type recombines inside the depletion region. The nonlinear distribution and erasure observed for the other case are well explained by considering the addition of another positive-charged ion injected during the poling process. This second ion acts as a barrier during thermal annealing and reduces the mobility of the first one.