
Immersion diffractometry for determining nanoscale grating pitch
Author(s) -
Sheng-Hua Lu,
Li-Cheng Tseng,
Ching-Fen Kao,
Shang-Peng Pan,
Liang-Chih Chang
Publication year - 2006
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.14.009564
Subject(s) - diffractometer , optics , materials science , grating , laser , wavelength , refractive index , optoelectronics , physics , scanning electron microscope
The laser diffractometer is an effective instrument for calibrating pitch standard of a grating structure. A conventional diffractometer based on the Littrow configuration cannot measure a grating whose pitch is less than half of the laser wavelength when the diffractometer is operated in the atmosphere. This study proposes an immersion diffractometer to raise the refractive index of the environment. Thus the new approach can overcome the limit of one-half wavelength. A 288 nm grating was measured using an immersion diffractometer with a 633 nm laser and using a conventional diffractometer with a 543 nm laser to demonstrate the feasibility and effectiveness of the proposed technology. The difference between the pitches obtained by these two methods is around 0.05 nm.