Optical properties of spin-on deposited low temperature titanium oxide thin films
Author(s) -
Juhani Rantala,
Ari Kärkkäinen
Publication year - 2003
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.11.001406
Subject(s) - materials science , refractive index , annealing (glass) , thin film , titanium , titanium oxide , optics , oxide , silicon oxide , wavelength , silicon , molar absorptivity , optoelectronics , composite material , nanotechnology , chemical engineering , metallurgy , silicon nitride , physics , engineering
This letter presents a method to fabricate high quality, high refractive index titanium oxide thin films by applying liquid phase spin-on deposition combined with low temperature annealing. The synthesis of the liquid form titanium oxide material is carried out using a sol-gel synthesis technique. The material can be annealed at low temperature (150 C degrees ) to achieve relatively high refractive index of 1.94 at 632.8 nm wavelength, whereas annealing at 350 C degrees results in index of 2.03 at 632.8 nm. Film depositions are demonstrated on silicon substrates with 0.5% uniformity in thickness. Refractive indices and extinction coefficients are characterized over a broad wavelength range to demonstrate the optical performance of this novel aqueous phase spin-on deposited hybrid titanium oxide material.
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