Open AccessInvestigation on reversed domain structures in lithium niobate crystals patterned by interference lithography
Author(s) -
Simonetta Grilli,
Pietro Ferraro,
S. De Nicola,
Andrea Fińizio,
G. Pierattini,
P. De Natale,
Marco Chiarini
Publication year - 2003
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.11.000392
Subject(s) - poling , lithium niobate , materials science , interference lithography , lithography , optics , interference (communication) , photonic crystal , fabrication , electric field , electron beam lithography , optoelectronics , nonlinear optics , photonics , photolithography , waveguide , nanoimprint lithography , nanolithography , resist , ferroelectricity , nanotechnology , laser , medicine , channel (broadcasting) , alternative medicine , physics , pathology , quantum mechanics , layer (electronics) , dielectric , electrical engineering , engineering
We demonstrate fabrication of periodically poled lithium niobate samples by electric field poling, after patterning by interference lithography. Furthermore we investigate the poling process at an overpoling regime which caused the appearance of submicron dot domains very similar to those induced by backswitch but different in nature. We show the possibility for realizing submicron-scaled threedimensional domain patterns that could be applied to the construction of photonic crystals and in nonlinear optics. We show that high etch-rate applied to such structures allows to obtain pyramidal-like submicron relief structures which in principle could find application for waveguide construction in photonic bandgap devices.