Open AccessLithographic fabrication of large diffractive optical elements on a concave lens surface
Author(s) -
Yanxia Xie,
Zhenwu Lu,
Fengyou Li,
Jing Zhao,
Zhicheng Weng
Publication year - 2002
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.10.001043
Subject(s) - optics , lithography , materials science , photoresist , lens (geology) , photolithography , electron beam lithography , maskless lithography , laser , grating , fabrication , optoelectronics , resist , physics , nanotechnology , medicine , alternative medicine , layer (electronics) , pathology
We demonstrate experimentally the lithography technique to fabricate a large computer-generated diffractive optical element (DOE) pattern on a concave lens surface with precise alignment by using a laser direct writer. We obtained photoresist film with uniform thickness on the large concave substrate by selecting proper spin-coating parameters, which mainly involve spin rate, spin acceleration, and viscosity of the photoresist. We obtained a square line profile on the concave lens surface. We can write lines that range in width from 0.7 to 10 microm using a single pass of the laser beam. We have designed and fabricated a grating on the concave lens surface using the laser direct writing lithography technique. It is believed that this technique can also transfer large DOE patterns, with a continuous surface relief, onto a convex or concave lens (mirror) surface.