High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography | Zendy

W. S. Cheong | Zendy; Larry Yuan | Zendy; V. Koudriachov | Zendy; Wei Yu | Zendy

Open Access

High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography

Author(s) -

W. S. Cheong,

Larry Yuan,

V. Koudriachov,

Wei Yu

Publication year - 2002

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.10.000586

Subject(s) - electron beam lithography , materials science , optics , lithography , fabrication , sol gel , cathode ray , beam (structure) , x ray lithography , scanning electron microscope , optoelectronics , resist , electron , nanotechnology , composite material , physics , medicine , alternative medicine , layer (electronics) , pathology , quantum mechanics

A negative-tone sensitive SiO2/TiO2 organic-inorganic hybrid sol-gel material was synthesized and characterized for fabrication of multilevel micro-optical elements by direct electron-beam lithography. The exposure was carried out by an in-house modified electron-beam writing system using LEO SEM-982 with Elphy Quantum exposure beam-blanking control system at 25keV. The hybrid Sol-Gel material demonstrated a superb sensitivity for doses between 0.22microC/cm2 and 0.33microC/cm2.

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