Open AccessHigh sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography
Author(s) -
Wai Chye Cheong,
Larry Xiaocong Yuan,
V. Koudriachov,
Wei Yu
Publication year - 2002
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.10.000586
Subject(s) - electron beam lithography , materials science , optics , lithography , fabrication , sol gel , cathode ray , x ray lithography , beam (structure) , scanning electron microscope , blanking , optoelectronics , resist , electron , nanotechnology , composite material , physics , medicine , alternative medicine , layer (electronics) , pathology , quantum mechanics , computer science , computer vision
A negative-tone sensitive SiO2/TiO2 organic-inorganic hybrid sol-gel material was synthesized and characterized for fabrication of multilevel micro-optical elements by direct electron-beam lithography. The exposure was carried out by an in-house modified electron-beam writing system using LEO SEM-982 with Elphy Quantum exposure beam-blanking control system at 25keV. The hybrid Sol-Gel material demonstrated a superb sensitivity for doses between 0.22microC/cm2 and 0.33microC/cm2.