Open AccessSurface passivation of silicon photonic devices with high surface-to-volume-ratio nanostructures
Author(s) -
Ahmed S. Mayet,
Hilal Cansizoglu,
Yang Gao,
Soroush Ghandiparsi,
A. Kaya,
Cesar Bartolo-Perez,
Badriyah Alhalaili,
Toshio Yamada,
Ekaterina Ponizovskaya Devine,
Aly F. Elrefaie,
Shih-Yuan Wang,
M. Saif Islam
Publication year - 2018
Publication title -
journal of the optical society of america. b, optical physics/journal of the optical society of america. b, online
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.741
H-Index - 144
eISSN - 1520-8540
pISSN - 0740-3224
DOI - 10.1364/josab.35.001059
Subject(s) - passivation , materials science , silicon , photovoltaics , optoelectronics , etching (microfabrication) , nanostructure , thermal oxidation , nanotechnology , layer (electronics) , photovoltaic system , electrical engineering , engineering