Open AccessModifications of ion beam sputtered tantala thin films by secondary argon and oxygen bombardment
Author(s) -
L. Yang,
Emmett Randel,
G. Vajente,
A. Ananyeva,
E. K. Gustafson,
A. S. Markosyan,
R. Bassiri,
M. M. Fejer,
Carmen S. Mei
Publication year - 2020
Publication title -
applied optics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.668
H-Index - 197
eISSN - 2155-3165
pISSN - 1559-128X
DOI - 10.1364/ao.59.00a150
Subject(s) - thin film , materials science , amorphous solid , sputtering , argon , oxygen , ion beam , optics , absorption (acoustics) , refractive index , ion , optoelectronics , beam (structure) , atomic physics , nanotechnology , composite material , chemistry , physics , organic chemistry