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Growth and characterization of Sc2O3 doped Ta2O5 thin films
Author(s) -
Mariana Fazio,
L. Yang,
A.S. Markosyan,
R. Bassiri,
M. M. Fejer,
Carmen S. Mei
Publication year - 2019
Publication title -
applied optics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.668
H-Index - 197
eISSN - 2155-3165
pISSN - 1559-128X
DOI - 10.1364/ao.59.00a106
Subject(s) - materials science , dopant , suboxide , refractive index , tantalum , doping , sputtering , thin film , scandium , absorption (acoustics) , analytical chemistry (journal) , band gap , characterization (materials science) , optics , optoelectronics , silicon , nanotechnology , metallurgy , chemistry , physics , chromatography , composite material
We present the optical and structural characterization of films of T a 2 O 5 , S c 2 O 3 , and S c 2 O 3 doped T a 2 O 5 with a cation ratio around 0.1 grown by reactive sputtering. The addition of S c 2 O 3 as a dopant induces the formation of tantalum suboxide due to the "oxygen getter" property of scandium. The presence of tantalum suboxide greatly affects the optical properties of the coating, resulting in higher absorption loss a λ =1064 n m . The refractive index and optical band gap of the mixed film do not correspond to those of a mixture of T a 2 O 5 and S c 2 O 3 , given the profound structural modifications induced by the dopant.

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