Open AccessPlasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source
Author(s) -
Rotem Kupfer,
Hernan Quevedo,
H. Smith,
Thanh N. Ha,
Andrew Yandow,
Ganesh Tiwari,
C. G. Richmond,
Fang Li,
B. M. Hegelich
Publication year - 2019
Publication title -
applied optics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.668
H-Index - 197
eISSN - 2155-3165
pISSN - 1559-128X
DOI - 10.1364/ao.58.004592
Subject(s) - optics , laser , materials science , plasma , nanosecond , infrared , far infrared laser , laser pumping , optoelectronics , physics , quantum mechanics
We characterized the plasma emission produced by the interaction of multi-millijoule, 40 ns duration, mid-infrared laser pulses with a silicon surface. The laser pulses were produced by a Q-switched Ho:YLF master oscillator power amplifier system. Using spectral measurements and a framing camera, we observed a spatial separation of the plasma plume, increased emission signal with low white-light generation, and a drop in the time- and space-averaged apparent plasma density with increasing pump energy. Our results can be explained by continuous heating of the plasma by the pump pulse due to the more efficient inverse bremsstrahlung absorption at longer wavelengths.