Review of the fundamentals of thin-film growth
Author(s) -
Norbert Kaiser
Publication year - 2002
Publication title -
applied optics
Language(s) - English
Resource type - Journals
ISSN - 0003-6935
DOI - 10.1364/ao.41.003053
Subject(s) - thin film , materials science , coalescence (physics) , dielectric , nucleation , optics , deposition (geology) , optoelectronics , optical coating , nanotechnology , chemistry , paleontology , physics , organic chemistry , sediment , astrobiology , biology
The properties of a thin film of a given material depend on the film's real structure. The real structure is defined as the link between a thin film's deposition parameters and its properties. To facilitate engineering the properties of a thin film by manipulating its real structure, thin-film formation is reviewed as a process starting with nucleation followed by coalescence and subsequent thickness growth, all stages of which can be influenced by deposition parameters. The focus in this review is on dielectric and metallic films and their optical properties. In contrast to optoelectronics all these film growth possibilities for the engineering of novel optical films with extraordinary properties are just beginning to be used.
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