Open Access3D photolithography through light field projections
Author(s) -
Hongjie Zhang,
Sy-Bor Wen
Publication year - 2020
Publication title -
applied optics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.668
H-Index - 197
eISSN - 2155-3165
pISSN - 1559-128X
DOI - 10.1364/ao.399508
Subject(s) - photolithography , photoresist , optics , light field , materials science , spatial light modulator , microlens , projection (relational algebra) , structured light , lithography , computer science , optoelectronics , physics , lens (geology) , layer (electronics) , nanotechnology , algorithm
A methodology of 3D photolithography through light field projections with a microlens array (MLA) is proposed and demonstrated. With the MLA, light from a spatial light modulator (SLM) can be delivered to arbitrary positions, i.e., voxels, in a 3D space with a focusing scheme we developed. A mapping function between the voxel locations and the SLM pixel locations can be one-to-one determined by ray tracing. Based on a correct mapping function, computer-designed 3D virtual objects can be reconstructed in a 3D space through a SLM and a MLA. The projected 3D virtual object can then be optically compressed and delivered to a photoresist layer for 3D photolithography. With appropriate near-UV light, 3D microstructures can be constructed at different depths inside the photoresist layer. This 3D photolithography method can be useful in high-speed 3D patterning at arbitrary positions. We expect high-precision 3D patterning can also be achieved when a femtosecond light source and the associated multi-photon curing process is adopted in the proposed light field 3D projection/photolithography scheme. Multi-photon polymerization can prevent the unwilling patterning of regions along the optical path before arriving to the designed focal voxels as observed in our single photon demonstrations.