Open AccessContrast analysis in two-beam laser interference lithography
Author(s) -
David B. Miller,
Adam M. Jones,
Robert R. McLeod
Publication year - 2020
Publication title -
applied optics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.668
H-Index - 197
eISSN - 2155-3165
pISSN - 1559-128X
DOI - 10.1364/ao.393741
Subject(s) - optics , interference lithography , beam splitter , lithography , photomask , maskless lithography , electron beam lithography , immersion lithography , interference (communication) , photolithography , polarization (electrochemistry) , grating , materials science , laser , physics , resist , computer science , fabrication , medicine , computer network , channel (broadcasting) , chemistry , alternative medicine , pathology , layer (electronics) , composite material