Monolithic formation of thin films on the vertical surface of a substrate by a dual-ion-beam sputtering technique | Zendy

Yutaka Uzawa | Zendy; Sumaru Niida | Zendy; Masanori Daibo | Zendy; Yasuo Kokubun | Zendy

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Monolithic formation of thin films on the vertical surface of a substrate by a dual-ion-beam sputtering technique

Author(s) -

Yutaka Uzawa,

Sumaru Niida,

Masanori Daibo,

Yasuo Kokubun

Publication year - 1996

Publication title -

applied optics

Language(s) - English

Resource type - Journals

ISSN - 0003-6935

DOI - 10.1364/ao.35.004128

Subject(s) - materials science , optics , thin film , sputtering , substrate (aquarium) , optoelectronics , planar , ion beam , waveguide , facet (psychology) , beam (structure) , focused ion beam , ion , nanotechnology , chemistry , computer science , psychology , social psychology , oceanography , physics , computer graphics (images) , personality , organic chemistry , geology , big five personality traits

We have developed a novel method for the selective deposition of thin films on the vertical surface of a planar substrate with a vertical step. This was done with a dual-ion-beam sputtering apparatus that is equipped with two ion-beam sources. Using this technique a multilayer filter was monolithically formed on the vertical surface of a Si substrate on which a photodetector had been fabricated, and clear filtering-photodetecting characteristics were observed. This technique can be applied to the monolithic integration of thin-film devices and waveguide-type optical devices with a vertical end facet.

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