Open AccessPlasma jet takes off.
Author(s) -
Lance Frazer
Publication year - 1999
Publication title -
environmental health perspectives
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 2.257
H-Index - 282
eISSN - 1552-9924
pISSN - 0091-6765
DOI - 10.1289/ehp.99107a414
Subject(s) - contamination , jet (fluid) , environmental science , environmental chemistry , national laboratory , waste management , plasma , carbon dioxide , chemical engineering , chemistry , engineering physics , engineering , nuclear physics , organic chemistry , physics , aerospace engineering , ecology , biology
Thanks to a series of joint research projects by Los Alamos National Laboratory, Beta Squared of Allen, Texas, and the University of California at Los Angeles, there is now a more environmentally sound method for cleaning semiconductor chips that may also be effective in cleaning up chemical, bacterial, and nuclear contaminants. The Atmospheric Pressure Plasma Jet uses a type of ionized gas called plasma to clean up contaminants by binding to them and lifting them away. In contrast to the corrosive acids and chemical solvents traditionally used to clean semiconductor chips, the jet oxidizes contaminants, producing only benign gaseous by-products such as oxygen and carbon dioxide. The new technology is also easy to transport, cleans thoroughly and quickly, and presents no hazards to its operators.