Open AccessMaskless Lithography Based on Digital Micro-Mirror Device (DMD) with Double Sided Microlens and Spatial Filter Array
Author(s) -
Duc-Hanh Dinh,
Hung-Liang Chien,
Yung-Chun Lee
Publication year - 2017
Publication title -
destech transactions on engineering and technology research
Language(s) - English
Resource type - Journals
ISSN - 2475-885X
DOI - 10.12783/dtetr/ameme2017/16261
Subject(s) - microlens , pinhole (optics) , optics , digital micromirror device , materials science , lithography , photomask , optoelectronics , photolithography , projection (relational algebra) , digital light processing , spatial filter , lens (geology) , physics , computer science , projector , resist , nanotechnology , layer (electronics) , algorithm