Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD). | Zendy

Алексей Верещака | Zendy; Aleksey Vereshchaka | Zendy

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Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD).

Author(s) -

Алексей Верещака,

Aleksey Vereshchaka

Publication year - 2014

Publication title -

bulletin of bryansk state technical university

Language(s) - English

Resource type - Journals

ISSN - 1999-8775

DOI - 10.12737/23189

Subject(s) - vacuum arc , cathodic protection , cathodic arc deposition , materials science , deposition (geology) , arc (geometry) , ion , vacuum deposition , substrate (aquarium) , common emitter , metallurgy , adhesion , ion plating , chemical engineering , analytical chemistry (journal) , nanotechnology , electrochemistry , electrode , composite material , coating , thin film , optoelectronics , chemistry , cathode , mechanical engineering , oceanography , engineering , biology , paleontology , chromatography , organic chemistry , sediment , geology

Developed a process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD). We used a special emitter (implantor) to generate Cr, Mo ions with high energy. Such key parameters of coatings as composition, structure, a thickness, hardness, adhesion in relation to a substrate obtained at various energy of chrome ions have been studied. A phenomenological (physical) model of assisted filtered cathodic-vacuum-arc deposition (AFCVAD), allows to predict the properties of the coatings formed on the basis of binary compounds as a function of the relationship Ra, characterizing parameters of ion implantation.

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