Open AccessDevelopment process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD).
Author(s) -
А. С. Верещака,
А. А. Верещака
Publication year - 2014
Publication title -
vestnik brânskogo gosudarstvennogo tehničeskogo universiteta
Language(s) - English
Resource type - Journals
ISSN - 1999-8775
DOI - 10.12737/23189
Subject(s) - vacuum arc , cathodic protection , cathodic arc deposition , materials science , deposition (geology) , arc (geometry) , ion , vacuum deposition , substrate (aquarium) , common emitter , metallurgy , adhesion , ion plating , chemical engineering , analytical chemistry (journal) , nanotechnology , electrochemistry , electrode , composite material , coating , thin film , optoelectronics , chemistry , cathode , mechanical engineering , oceanography , engineering , biology , paleontology , chromatography , organic chemistry , sediment , geology
Developed a process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD). We used a special emitter (implantor) to generate Cr, Mo ions with high energy. Such key parameters of coatings as composition, structure, a thickness, hardness, adhesion in relation to a substrate obtained at various energy of chrome ions have been studied. A phenomenological (physical) model of assisted filtered cathodic-vacuum-arc deposition (AFCVAD), allows to predict the properties of the coatings formed on the basis of binary compounds as a function of the relationship Ra, characterizing parameters of ion implantation.