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Oxygen and Silicon K-EXAFS in SiO2
Author(s) -
R. Nietubyć
Publication year - 1994
Publication title -
acta physica polonica a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.217
H-Index - 38
eISSN - 1898-794X
pISSN - 0587-4246
DOI - 10.12693/aphyspola.86.741
Subject(s) - extended x ray absorption fine structure , oxygen , silicon , materials science , analytical chemistry (journal) , chemistry , optoelectronics , physics , absorption spectroscopy , optics , environmental chemistry , organic chemistry

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