Open AccessInverse RIE Lag during Silicon Etching in SF6 + O2 Plasma
Author(s) -
R. Knizikevičius
Publication year - 2020
Publication title -
acta physica polonica. a
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.217
H-Index - 38
eISSN - 1898-794X
pISSN - 0587-4246
DOI - 10.12693/aphyspola.137.313
Subject(s) - lag , materials science , silicon , etching (microfabrication) , plasma , plasma etching , inverse , analytical chemistry (journal) , optoelectronics , composite material , physics , chemistry , mathematics , nuclear physics , computer science , geometry , environmental chemistry , computer network , layer (electronics)