Investigation on the Effect of Direct Current and Integrated Pulsed Electrochemical Etching of n-Type (100) Silicon
Author(s) -
Nurul Syuhadah Mohd Razali,
Alhan Farhanah Abd Rahim,
Rosfariza Radzali,
Ainorkhilah Mahmood,
Yusnizam Yusuf,
Fatimah Zulkifli,
Ahmad Shuhaimi Abu Bakar
Publication year - 2019
Publication title -
acta physica polonica a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.217
H-Index - 38
eISSN - 1898-794X
pISSN - 0587-4246
DOI - 10.12693/aphyspola.135.697
Subject(s) - porous silicon , materials science , photoluminescence , etching (microfabrication) , silicon , porosity , crystallite , hydrofluoric acid , analytical chemistry (journal) , raman spectroscopy , scanning electron microscope , nanotechnology , chemical engineering , optoelectronics , composite material , optics , metallurgy , chemistry , physics , engineering , layer (electronics) , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom