Open AccessStructure and Some Physical Properties of Chemically Deposited Nickel Sulfide Thin Films
Author(s) -
Ahmed H. Hammad,
Zeinab S. El-Mandouh,
H.A. Elmeleegi
Publication year - 2015
Publication title -
acta physica polonica a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.217
H-Index - 38
eISSN - 1898-794X
pISSN - 0587-4246
DOI - 10.12693/aphyspola.127.901
Subject(s) - amorphous solid , thin film , materials science , band gap , deposition (geology) , chemical bath deposition , nickel sulfide , sulfide , nickel , analytical chemistry (journal) , activation energy , chemical engineering , chemistry , nanotechnology , crystallography , metallurgy , optoelectronics , engineering , chromatography , biology , sediment , paleontology
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