Open AccessEffect of High-Temperature Activation Annealing on F Ion Diffusion in 4H-SiC
Author(s) -
彩萍 万
Publication year - 2018
Publication title -
smart grid
Language(s) - English
Resource type - Journals
eISSN - 2161-8771
pISSN - 2161-8763
DOI - 10.12677/sg.2018.81002
Subject(s) - annealing (glass) , materials science , ion , diffusion , analytical chemistry (journal) , engineering physics , thermodynamics , chemistry , composite material , physics , chromatography , organic chemistry
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom