Open AccessEffect of O<sub>2</sub> Flux on the Growth Process of HfO2 Thin Films Deposited by Reactive Sputtering
Author(s) -
宇桐 杨
Publication year - 2013
Publication title -
advances in condensed matter physics
Language(s) - English
Resource type - Journals
eISSN - 2326-3512
pISSN - 2326-3520
DOI - 10.12677/cmp.2013.21003
Subject(s) - x ray photoelectron spectroscopy , thin film , amorphous solid , sputtering , materials science , stoichiometry , analytical chemistry (journal) , morphology (biology) , argon , chemical composition , chemical engineering , nanotechnology , chemistry , crystallography , chromatography , organic chemistry , biology , engineering , genetics
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