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Analysis of Self-Diffusion of FCC Transition Metals by Modified Analytical Embedded-Atom Method
Author(s) -
国祥 陈
Publication year - 2013
Publication title -
applied physics
Language(s) - English
Resource type - Journals
eISSN - 2160-7567
pISSN - 2160-7575
DOI - 10.12677/app.2013.31001
Subject(s) - diffusion , vacancy defect , activation energy , atom (system on chip) , self diffusion , transition metal , k nearest neighbors algorithm , diffusion process , energy (signal processing) , chemistry , materials science , crystallography , atomic physics , thermodynamics , analytical chemistry (journal) , physics , innovation diffusion , catalysis , self service , computer science , embedded system , biochemistry , knowledge management , chromatography , marketing , quantum mechanics , artificial intelligence , business

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