
Research Progress of the Linear Plasma Source Used in the Films Deposition over Large Areas
Publication year - 2012
Publication title -
ying yong wi li/ying yong wu li
Language(s) - English
Resource type - Journals
eISSN - 2160-7567
pISSN - 2160-7575
DOI - 10.12677/app.2012.24019
Subject(s) - plasma , materials science , magnetic field , microwave , thin film , computational physics , optoelectronics , physics , nanotechnology , quantum mechanics