Open AccessResearch Progress of the Linear Plasma Source Used in the Films Deposition over Large Areas
Publication year - 2012
Publication title -
applied physics
Language(s) - English
Resource type - Journals
eISSN - 2160-7567
pISSN - 2160-7575
DOI - 10.12677/app.2012.24019
Subject(s) - plasma , materials science , magnetic field , microwave , thin film , computational physics , optoelectronics , physics , nanotechnology , quantum mechanics
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