Open AccessDevelopment of prototype hat patterns for elderly women based on three-dimensional modeling
Author(s) -
Jungil Jun,
Youngshil Ryoo,
Kwang Woo Choi,
Sun-Mi Park
Publication year - 2021
Publication title -
fashion and textiles
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.457
H-Index - 13
ISSN - 2198-0802
DOI - 10.1186/s40691-021-00258-5
Subject(s) - population , computer science , flattening , head (geology) , frame (networking) , group (periodic table) , engineering , telecommunications , demography , biology , mechanical engineering , paleontology , chemistry , organic chemistry , sociology
Population aging is a global phenomenon, and the elderly population has a higher economic capability today than that in the past. Thus, this population is considered to be a growing consumer group that enjoys both consumer and leisure life. In this study, we developed prototype hat patterns for elderly women that can be used for developing close-fitting hats, helmets, masks, and smart headwear. Three-dimensional (3D) head scan data of elderly women were employed herein, and the data were classified into three groups with common head size and head shape. The target group was selected from a high-frequency group among the classified groups, and a standard head form representing the target group was developed using averaging and wire frame generation techniques. Four hat types were considered, design baselines were developed for each type, and prototype patterns were designed for each hat type using a flattening technique. The suitability of the developed prototype hat patterns was subsequently verified. Our results showed that all four prototype patterns had errors less than 5 mm 2 (1.40%). The hat patterning method proposed in this study is expected to improve the wearing comfort of high-value-added products designed for the elderly.