Open AccessHow the global layout of the mask influences masking strength
Author(s) -
Tandra Ghose,
Frouke Hermens,
Michael H. Herzog
Publication year - 2013
Publication title -
journal of vision
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.126
H-Index - 113
ISSN - 1534-7362
DOI - 10.1167/13.9.826
Subject(s) - luminance , masking (illustration) , backward masking , computer science , vernier scale , offset (computer science) , visual masking , perception , artificial intelligence , physics , optics , visual perception , psychology , neuroscience , art , visual arts , programming language