Transition of MEMS Technology to Nanofabrication | Zendy

H. Luesebrink | Zendy; T. Glinsner | Zendy; Stephen C. Jakeway | Zendy; H. John Crabtree | Zendy; Neil S. Cameron | Zendy; Hélène Roberge | Zendy; Teodor Veres | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Transition of MEMS Technology to Nanofabrication

Author(s) -

H. Luesebrink,

T. Glinsner,

Stephen C. Jakeway,

H. John Crabtree,

Neil S. Cameron,

Hélène Roberge,

Teodor Veres

Publication year - 2005

Publication title -

journal of nanoscience and nanotechnology

Language(s) - English

Resource type - Journals

eISSN - 1533-4899

pISSN - 1533-4880

DOI - 10.1166/jnn.2005.129

Subject(s) - materials science , nanoimprint lithography , embossing , microelectromechanical systems , nanolithography , fabrication , nanotechnology , lithography , nano , nanometre , microfluidics , molding (decorative) , optoelectronics , composite material , medicine , alternative medicine , pathology

The transition of MEMS technology to nano fabrication is a solution to the growing demand for smaller and high-density feature sizes in the nanometer scale. Nanoimprint lithography (NIL) techniques for fabricating micro- and nano-features are discussed including hot embossing lithography (HEL), UV Molding (UVM) and micro contact printing (microCP). Recent results in micro and nano-pattern transfer are presented where features ranged from < 100 nm to several centimeters. We also present a comparative study between standard glass microfluidic chips and their HEL counterparts by metrology. Hot-embossed microfluidic chips are shown to be faithful replicates of their parent stamps. NIL is presented as a promising avenue for low-cost, high throughput micro and nano-device fabrication.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research