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Mechanism and Motion of Semifixed Abrasive Grit for Wire-Saw Slicing
Author(s) -
Chunyan Yao,
Wei Peng,
Siyuan Chen
Publication year - 2013
Publication title -
advances in mechanical engineering/advances in mechanical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.318
H-Index - 40
eISSN - 1687-8140
pISSN - 1687-8132
DOI - 10.1155/2013/628027
Subject(s) - slicing , abrasive , materials science , wafer , slurry , mechanical engineering , wire speed , process (computing) , computer science , engineering drawing , composite material , engineering , nanotechnology , operating system
The currently dominant method in the production of wafers is to use slurry wire-saw slicing. This paper reports a new wire-saw slicing technology, namely, semifixed abrasive wire-saw slicing. The traditional smooth wire is replaced by a patterned wire with a textured surface that can help the wire carrying the abrasives. It aims to improve the number of transient fixed abrasives in the machining process. Transient fixed abrasives can produce “scratch-indenting” processes that are similar to fixed-abrasive wire slicing thereby improving the efficiency of the wire-saw cutting. This study focuses on the behavioral mechanics of the abrasive grits in the slurry during the slicing process. The dynamic images of the movement of abrasive grits in the slicing process are obtained by a high-speed camera. At the microlevel, using statistical methods, the behavioral mechanics of the abrasive grits are investigated by changing the slicing parameters. The results contribute toward a more intuitive and profound understanding of the principle of free-abrasive wire sawing

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