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Study of Vertical Ga2O3 FinFET Short Circuit Ruggedness using Robust TCAD Simulation
Author(s) -
Albert Lu,
Adam Elwailly,
Yuhao Zhang,
Hiu Yung Wong
Publication year - 2022
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ac9e73
Subject(s) - materials science , optoelectronics , transistor , circuit design , voltage , threshold voltage , thermal , thermal conductivity , gallium , electronic engineering , electrical engineering , engineering , physics , thermodynamics , metallurgy , composite material

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