z-logo
open-access-imgOpen Access
Water Flow Improvement by Pinhole Outlet in Batch-Type Wet Cleaning Bath for Large-Diameter Wafers
Author(s) -
Toko Tsuchida,
Toshinori Takahashi,
Hitoshi Habuka,
Akihiro Goto
Publication year - 2022
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ac7bf0
Subject(s) - wafer , pinhole (optics) , materials science , water flow , volumetric flow rate , flow visualization , flow (mathematics) , composite material , front (military) , optics , optoelectronics , mechanics , environmental science , environmental engineering , mechanical engineering , physics , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom